埃德萬斯：高端非硅微納機電技術(shù)的專家

半導(dǎo)體制造

柔性基底上微納米鍍膜制造工藝代表著當(dāng)今高端制造的水平， 北京埃德萬斯（Advancedmems）離子束技術(shù)研究所股份有限公司自主研發(fā)的離子束刻蝕機、離子束濺射鍍膜機正是非硅微納機電制造的核心設(shè)備。埃德萬斯總經(jīng)理高云龍強調(diào)，我們所擁有的是以上百臺裝機規(guī)模為基礎(chǔ)的“離子束綜合應(yīng)用體系綜合解決方案開放平臺”。

埃德萬斯上世紀(jì)80年代在中國離子束科技導(dǎo)師和技術(shù)應(yīng)用領(lǐng)軍人物劉金聲帶領(lǐng)下，自主研發(fā)了國內(nèi)首臺商用成套離子束刻蝕機、離子束濺射鍍膜機，并在此基礎(chǔ)上樹立起自主可控的離子束應(yīng)用工藝技術(shù)系統(tǒng)。多年來，埃德萬斯一直低調(diào)服務(wù)于國內(nèi)航空、航天、兵器等軍工領(lǐng)域，伴隨“中國制造2025”戰(zhàn)略的發(fā)布實施，開始從軍工走向民用市場。

Advanced開發(fā)的第四代離子束刻蝕系統(tǒng)、國際流行的CAIBE系統(tǒng)、雙離子束薄膜制造與改性系統(tǒng)，以及近年開發(fā)出的三離子束合成薄膜系統(tǒng)和國際首創(chuàng)微機控制快速變深度刻蝕系統(tǒng)，是具備國際商售水平的實用型成套設(shè)備，擁有獨立自主的知識產(chǎn)權(quán)，一直是受廣大用戶高度認(rèn)可的國內(nèi)的主流產(chǎn)品，長期占據(jù)國內(nèi)市場70%以上的份額。

埃德萬斯正在構(gòu)建的非硅產(chǎn)業(yè)工藝研發(fā)集群是其獨有優(yōu)勢和潛在價值所在。埃德萬斯跨界創(chuàng)新驅(qū)動平臺的戰(zhàn)略，是在充分吸收和借鑒德國“工業(yè)4.0”的聯(lián)合模式基礎(chǔ)上設(shè)計的，可概括為“1+1+1”：一個發(fā)展高附加值制造業(yè)的科技創(chuàng)新聯(lián)盟，一個非硅MEMS創(chuàng)新實驗基地，一個打造后工業(yè)時代示范工廠。高云龍稱，在整合基礎(chǔ)上，將這一平臺與產(chǎn)業(yè)對接，形成一個產(chǎn)、學(xué)、研、用并聯(lián)的技術(shù)研發(fā)集群，更好地適應(yīng)未來智能制造引發(fā)的生產(chǎn)模式和產(chǎn)業(yè)形態(tài)。

通過推動非硅芯片、非硅MEMS產(chǎn)業(yè)發(fā)展，為中國高端制造業(yè)進步、轉(zhuǎn)型提供技術(shù)、工藝、設(shè)備支持，是埃德萬斯依據(jù)自身技術(shù)和開發(fā)優(yōu)勢試圖打造面向中國高端制造、具有自主知識產(chǎn)權(quán)的微納米產(chǎn)業(yè)線上及線下開放平臺的著力點。2016年，埃德萬斯在其牽頭起草的國內(nèi)首個“關(guān)于中國構(gòu)架非硅MEMS發(fā)展戰(zhàn)略報告”中建議：“布局智能制造，要關(guān)注微納米制造領(lǐng)域中MEMS整體發(fā)展，對非硅MEMS作適度加法，對MEMS作適度減法。”

高云龍表示，擁有著先進離子束加工技術(shù)以及豐富工藝開發(fā)轉(zhuǎn)化經(jīng)驗的埃德萬斯，將秉承科技報國精神，堅守一貫的創(chuàng)新理念，充分發(fā)揮自身各項優(yōu)勢，與業(yè)界共享技術(shù)成果、共同開拓離子束技術(shù)應(yīng)用新天地。

ADVANCED: An Expert in High-end Non Silicon Micro Electro Mechanical Technology

Flexible substrate micro nano coating manufacturing technology represents the high-end manufacturing level, Beijing Ed Vance (Advancedmems) ion beam etching, ion beam sputtering machine ion beam Technology Research Institute of Limited by Share Ltd is the independent research and development of non silicon micro nano core mechanical and electrical equipment manufacturing. Advanced general manager Gao Yunlong stressed that what we have is the basis of "ion beam integrated application system integrated solutions more than 100 open platform installed capacity".

Ed Vance on 80s in China century science and technology and application of ion beam mentor leader under the leadership of Liu Jinsheng, developed the first domestic commercial complete sets of ion beam etching, ion beam sputtering machine, set up the application of ion beam technology system and on the basis of self-control. Over the years, has been low-key service in the domestic advanced aerospace, weapons and other military fields, with "2025 Chinese manufacturing" strategy implementation of release, starting from the military to civilian market.

Advanced development of the fourth generation of ion beam etching system, the international popular CAIBE system, dual ion beam film fabrication and modification of the system, as well as three in recent years to develop the ion beam synthesis film system and the first international deep etching system fast variable microcomputer control, practical equipment with the international commercial level, with independent intellectual property rights that is highly recognized by the majority of users of domestic mainstream products, long-term occupy the domestic market share of more than 70%.

Ed Vance is building non silicon industry process R & D cluster is its unique advantages and potential value. Drive platform strategy is in advanced cross-border innovation, fully absorb and learn from the design of the German industrial 4 combined on the basis of the model, can be summarized as "1+1+1": a development of high value-added manufacturing technology innovation alliance, a non silicon MEMS innovation experiment base, build a demonstration plant in post industrial era. Gao Yunlong said that in the integration on the basis of the docking of the platform and the industry, formed a production, learning and research, technology research and development of parallel cluster, better adapt to the future of intelligent manufacturing caused by the production mode and the form of industry.

Through the promotion of non silicon and non silicon MEMS industry development, progress and transformation process, provide technical and equipment support for China high-end manufacturing, is the focal point on the basis of their advanced technology and development advantages of trying to build Chinese oriented high-end manufacturing, with independent intellectual property rights of the micro nano industry online and offline open platform. In 2016, the advanced led the drafting of China's first "on the China framework of non reporting" development strategy of silicon MEMS suggested: "the layout of intelligent manufacturing, to focus on MEMS micro nano manufacturing overall development, make appropriate additions to non silicon MEMS, make appropriate subtraction of MEMS."

Gao Yunlong said, with advanced ion beam processing technology and rich experience in the development process of transformation advanced, will uphold the spirit of science and technology to serve the country, adhere to the concept of innovation consistent, give full play to their various advantages, sharing technological achievements, the co-development of new technology and industry application of ion beam.